The TM3000 is Hitachi High Technologies latest Tabletop Microscope. New features include variable accelerating voltage, higher beam current, larger stage and chamber, and smaller footprint.
The XE-100 is our flagship AFM with reduced drift rate and the Step-and-Scan Automation that provides the ultimate AFM/SPM performance in Non-Contact nanoscale metrology.
The IR-OBIRCH Analysis System "μAMOS" is a semiconductor failure analyzer which uses IR-OBIRCH (Infrared Optical Beam Induced Resistance CHange) method for localization of leakage current path and the abnormal resistance part of contacts (via contact) in LSI devices.
The PHI 5000 VersaProbe is a multi-technique surface analysis instrument based on PHI's highly successful scanning x-ray microprobe technology.
The FB2200 allows for rapid and precise specimen preparation for both transmission and scanning electron microscopy of semiconductors and other advanced materials.
B136 L1 C. Arellano St.
Katarungan Vill., (Daang Hari), Poblacion Muntinlupa City 1776, Philippines
Phone - (632)358-5889 (Service)
- (632)576-8913 (Sales)
- (632)576-1599 (Admin/Accounting) Fax - (632) 807-8392 Hotlines - 0928 503-3281 (Smart)
- 0917 847-5730 (Globe) Email - firstname.lastname@example.org - email@example.com
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|PHI 700 Xi||The PHI 700Xi Scanning Auger Nanoprobe provides high performance Auger (AES) spectral analysis, Auger imaging, and sputter depth profiling of complex materials including: nanomaterials, catalysts, metals, and electronic devices.|
|Quantera II XPS||The Quantera II is the next generation of PHI’s highly successful scanning XPS microprobe product line. The Quantera II provides high sensitivity large and micro-area spectroscopy, superior inorganic and organic depth profiling, and the fully automated analysis of insulating or conductive samples.|
|VersaProbe XPS||The PHI 5000 VersaProbe is a multi-technique surface analysis instrument based on PHI's highly successful scanning x-ray microprobe technology. This technology provides high performance XPS micro-area spectroscopy, chemical imaging, and secondary electron imaging with a raster scanned 10 µm diameter x-ray beam.|
|nanoTOF TOF-SIMS||The new PHI TRIFT V nanoTOF surface analysis instrument is the next generation of PHI's highly successful line of TOF-SIMS instruments which utilize the patented TRIFT analyzer. Several significant improvements have been introduced with the nanoTOF.|