The TM3000 is Hitachi High Technologies latest Tabletop Microscope. New features include variable accelerating voltage, higher beam current, larger stage and chamber, and smaller footprint.
The XE-100 is our flagship AFM with reduced drift rate and the Step-and-Scan Automation that provides the ultimate AFM/SPM performance in Non-Contact nanoscale metrology.
The IR-OBIRCH Analysis System "μAMOS" is a semiconductor failure analyzer which uses IR-OBIRCH (Infrared Optical Beam Induced Resistance CHange) method for localization of leakage current path and the abnormal resistance part of contacts (via contact) in LSI devices.
The PHI 5000 VersaProbe is a multi-technique surface analysis instrument based on PHI's highly successful scanning x-ray microprobe technology.
The FB2200 allows for rapid and precise specimen preparation for both transmission and scanning electron microscopy of semiconductors and other advanced materials.
B136 L1 C. Arellano St.
Katarungan Vill., (Daang Hari), Poblacion Muntinlupa City 1776, Philippines
Phone - (632)358-5889 (Service)
- (632)576-8913 (Sales)
- (632)576-1599 (Admin/Accounting) Fax - (632) 807-8392 Hotlines - 0928 503-3281 (Smart)
- 0917 847-5730 (Globe) Email - firstname.lastname@example.org - email@example.com
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|Critical Point Dryers||Critical point drying is an established method of dehydrating biological tissue prior to examination in the scanning electron microscope. The technique was first introduced commercially for scanning electron microscopy (SEM) specimen preparation by Polaron in 1970. The original design concepts, which included a horizontal chamber, are still embodied in the design of the E3000 and E3100 systems.|
|Sputter Coaters and
SEM/TEM Carbon Coaters
|Sputter coating is the standard method for preparing non-conducting or poorly conducting specimens for observation in a scanning electron microscope (SEM). We offer low-cost, rotary-pumped systems for depositing non-oxidising metals - such as gold (Au) and platinum (Pt) - and also turbomolecular-pumped models, suitable for oxidising and non-oxidising metals - such as chromium (Cr).|
|Glow Discharge Systems||The primary application of glow discharge is as a technique for the surface modification, or 'wetting', of newly-evaporated transmission electron microscopy (TEM) carbon support films.|
|Thermal evaporation under high vacuum is an established method of depositing thin layers of metals and carbon. Typical applications include the production of support films and specimen replicas for transmission electron microscopy (TEM) and many thin-film applications.|
|RF Plasma Etchers/Plasma
|RF plasma allows the low-temperature modification of a wide range of specimens and substrates. Plasma etching is generally confined to the semiconductor industry, typically for the removal of silicon layers using reactive gases, such as CF4 and for the removal of Photoresist using oxygen.|