The TM3000 is Hitachi High Technologies latest Tabletop Microscope. New features include variable accelerating voltage, higher beam current, larger stage and chamber, and smaller footprint.
The XE-100 is our flagship AFM with reduced drift rate and the Step-and-Scan Automation that provides the ultimate AFM/SPM performance in Non-Contact nanoscale metrology.
The IR-OBIRCH Analysis System "μAMOS" is a semiconductor failure analyzer which uses IR-OBIRCH (Infrared Optical Beam Induced Resistance CHange) method for localization of leakage current path and the abnormal resistance part of contacts (via contact) in LSI devices.
The PHI 5000 VersaProbe is a multi-technique surface analysis instrument based on PHI's highly successful scanning x-ray microprobe technology.
The FB2200 allows for rapid and precise specimen preparation for both transmission and scanning electron microscopy of semiconductors and other advanced materials.
SIGMATECH, INC.
B136 L1 C. Arellano St.
Katarungan Vill., (Daang Hari), Poblacion
Muntinlupa City 1776, Philippines
Phone - (632)358-5889 (Service)
- (632)576-8913 (Sales)
- (632)576-1599 (Admin/Accounting)
Fax - (632) 807-8392
Hotlines - 0928 503-3281 (Smart)
- 0917 847-5730 (Globe)
Email - sales@sigmatech-inc.com
- service@sigmatech-inc.com
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| XE-70 | ![]() |
XE-70 is Park Systems’ AFM solution for researchers with limited budget. XE-70 does not compromise any of the innovative technologies of the XE-series that sets it apart from conventional AFMs, supporting the same modes, options, and electronics as all other systems in the XE product line. |
| XE-100 | ![]() |
The XE-100 is our flagship AFM with reduced drift rate and the Step-and-Scan Automation that provides the ultimate AFM/SPM performance in Non-Contact nanoscale metrology. It is a mid-priced system for materials science, polymers, electrochemistry and other applications in nanoscience and engineering. It can adopt a wide range of optical coupling with its open side access. |
| XE-120 | ![]() |
Take the award-winning XE-100, shrink it such that it can be placed on top of the many popular inverted optical microscopes, and you have the versatile XE-120, an exceptional AFM with expanded sample and interactivity flexibility. The XE-120 is the research grade AFM with industry’s only True Non-Contact modeTM imaging for both air and liquid imaging. |
| XE-150 | ![]() |
With the arrival of the XE-150, Park Systems' large sample AFM, Non-Contact AFM imaging has become the most feasible and practical way to scan your large samples with ultimate AFM resolution and reliability. The XY motorized sample stage is optimized for both small and large sample placement, 150 mm × 150 mm, and allows full travel over the entire sample. |
| XE-NSOM | ![]() |
The XE-NSOM is specially designed and tailored for advanced optical measurements including Near-field Scanning Optical Microscopy (NSOM), Raman Spectrometry, and Confocal Microscopy. The XE-NSOM provides a complete AFM system setup with unsurpassed versatility for these optical experiments. |
| XE-BIO | ![]() |
XE-Bio is a powerful 3-in-1 nanoscience research tool that uniquely combines industry’s only True Non-Contact AFM with Ion Conductance Microscopy (ICM) and inverted optical microscope on the same platform. The modular design of the XE-Bio allows easy exchange between non-contact AFM and ICM. |
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| XE-HDM | ![]() |
Park Systems’ XE-HDM delivers: (1) the Automatic Defect Review (ADR) AFM that revolutionizes the way defects in HDD substrates and media are searched, scanned, and analyzed. (2) the industry’s lowest noise floor of less than 0.5 A, and by combing it with the True Non-Contact ModeTM , that makes it possible to acquire consistent repeatable and reproducible sub-nano roughness measurements time after time. |
| XE-PTR | ![]() |
Our Programmable Data Density feature enables faster imaging by automatically adjusting the scanning pixel density to reflect the relative size of the feature being scanned. As a result, users generate images with highly detailed regions of interest within larger macrostructures, all in one scan. |
| XE-3DM | ![]() |
Park Systems provides a reference metrology system for the critical dimension and sidewall analysis. As a fully automated AFM system, the 3DM allows for sidewall, undercut, and line/trench width characterization. With our True Non-Contact Mode™, our XE-3DM is capable of imaging the most challenging structures such as soft photoresists and 3D multilayer topologies. |
| XE-WAFER | ![]() |
The XE-Wafer is a fully automated industrial AFM that can measure surface roughness, trench width, depth and angle measurements on 200mm & 300mm wafers with precision in a production environment. . |