The TM3000 is Hitachi High Technologies latest Tabletop Microscope. New features include variable accelerating voltage, higher beam current, larger stage and chamber, and smaller footprint.
The XE-100 is our flagship AFM with reduced drift rate and the Step-and-Scan Automation that provides the ultimate AFM/SPM performance in Non-Contact nanoscale metrology.
The IR-OBIRCH Analysis System "μAMOS" is a semiconductor failure analyzer which uses IR-OBIRCH (Infrared Optical Beam Induced Resistance CHange) method for localization of leakage current path and the abnormal resistance part of contacts (via contact) in LSI devices.
The PHI 5000 VersaProbe is a multi-technique surface analysis instrument based on PHI's highly successful scanning x-ray microprobe technology.
The FB2200 allows for rapid and precise specimen preparation for both transmission and scanning electron microscopy of semiconductors and other advanced materials.
SIGMATECH, INC.
B136 L1 C. Arellano St.
Katarungan Vill., (Daang Hari), Poblacion
Muntinlupa City 1776, Philippines
Phone - (632)358-5889 (Service)
- (632)576-8913 (Sales)
- (632)576-1599 (Admin/Accounting)
Fax - (632) 807-8392
Hotlines - 0928 503-3281 (Smart)
- 0917 847-5730 (Globe)
Email - sales@sigmatech-inc.com
- service@sigmatech-inc.com
TM3000 Tabletop Microscope - Smaller, compact and lightweight design,
- Higher resolution, higher magnification
- Easier to operate,
- One button auto start,
- Larger stage, larger samples
- Variable accelerating voltage,
(enhanced sample surface observation)
- Beam current control...
Research AFM - XE-100The XE-100 is our flagship AFM with reduced drift rate and the Step-and-Scan Automation that provides the ultimate AFM/SPM performance in Non-Contact nanoscale metrology. It is a mid-priced system for materials science, polymers, electrochemistry and other applications in nanoscience and engineering.
IR-OBIRCH Analysis SystemThe IR-OBIRCH Analysis System "μAMOS" is a semiconductor failure analyzer which uses IR-OBIRCH (Infrared Optical Beam Induced Resistance CHange) method for localization of leakage current path and the abnormal resistance part of contacts (via contact) in LSI devices.
PHI VersaProbe XPS MicroprobeThe PHI 5000 VersaProbe is a multi-technique surface analysis instrument based on PHI's highly successful scanning x-ray microprobe technology. This technology provides high performance XPS micro-area spectroscopy, chemical imaging, and secondary electron imaging with a raster scanned 10 µm diameter x-ray beam.
FB2200 Focused Ion Beam SystemThe Next Generation for Higher Throughput, Precision & Quality. Offering High-speed TEM Sample Preparation with Large area lon Beam Milling.