TM3000 Tabletop Microscope

The TM3000 is Hitachi High Technologies latest Tabletop Microscope. New features include variable accelerating voltage, higher beam current, larger stage and chamber, and smaller footprint. The TM3000 is a real alternative to optical microscopes, stereo microscopes and confocal laser scanning microscopes. It has applications for many sectors including life science, food, cosmetics, healthcare, pharmaceutical, textiles, materials science, semiconductor and education.

Research AFM - XE-100

The XE-100 is our flagship AFM with reduced drift rate and the Step-and-Scan Automation that provides the ultimate AFM/SPM performance in Non-Contact nanoscale metrology. It is a mid-priced system for materials science, polymers, electrochemistry and other applications in nanoscience and engineering. It can adopt a wide range of optical coupling with its open side access.

IR-OBIRCH Analysis System

The IR-OBIRCH Analysis System "μAMOS" is a semiconductor failure analyzer which uses IR-OBIRCH (Infrared Optical Beam Induced Resistance CHange) method for localization of leakage current path and the abnormal resistance part of contacts (via contact) in LSI devices.

The S/N ratio can be greatly improved by using a lock-in unit to detect OBIRCH signal at specific frequency. Furthermore, by using the high current probe head, devices running at high current and high voltage can be analyzed.

PHI VersaProbe XPS Microprobe

The PHI 5000 VersaProbe is a multi-technique surface analysis instrument based on PHI's highly successful scanning x-ray microprobe technology. This technology provides high performance XPS micro-area spectroscopy, chemical imaging, and secondary electron imaging with a raster scanned 10 µm diameter x-ray beam.

PHI's innovative and patented dual beam charge neutralization method provides turn-key analysis of insulating samples using a combination of low energy ions and electrons.

FB2200 Focused Ion Beam System

The FB2200 allows for rapid and precise specimen preparation for both transmission and scanning electron microscopy of semiconductors and other advanced materials.

High precision and high milling rates - The use of a new low aberration ion optical system allows a maximum beam current of 60nA at an accelerating voltage of 40 kV.