
Key Features
Summary of the cryo preparation technique
The sample is rapidly cooled and transferred under vacuum to the cold stage of the preparation chamber, which is mounted on to the SEM chamber. The preparation chamber is pumped either with a rotary pump (PP2000 cryo-SEM) or by a specially designed turbomolecular pumping system (PP2000T cryo-SEM). The sample can be fractured, etched to reveal greater detail and coated with metal by sputtering or with carbon by evaporation. Finally, the sample can be loaded under vacuum into the SEM chamber where it is easily located on a cold stage specifically tailored to the SEM. At all stages of the procedure the sample is maintained at a "safe" temperature of lower than -140oC.
The PP2000 cryo-SEM Series also embodies design features that ensure the vacuum in all three areas is optimally clean and that samples risk minimal exposure to contamination.
The PP2000 cryo-SEM series is the result of many years experience of cryo techniques and vacuum and coating technologies. The instrumentation is "logical", easy to understand, simple to use and maintain and will give high quality results from a wide range of samples.

A 'self contained' (independent) preparation system, with a turbo molecular, high vacuum pumping unit to allow the freezing, preparation, transferring, and subsequent examination of frozen hydrated specimens in a Scanning Electron Microscope and Field Emission SEM, without the need to utilise the SEM vacuum system.
The System will interface to all the current range of SEMs and the component parts will allow reverting to ambient temperature applications to be readily achieved.

K850WM Critical Point Dryer
The K850WM is designed to critical point dry a complete 150mm (6") wafer. The K850WM has built-in heating and water cooling (see: E4860 heater / chiller) and will give temperature control of +5°C cooling and +35°C during heating. This ensures the critical point is accurately obtained, avoiding excess pressures or temperatures, or the need to rely on pressure relief valves to control pressure during the heating cycle. The K850WM has a vertical chamber which allows top loading of specimens. A viewing port is fitted in the top plate for sample observation. The K850WM sample exchange mechanism is simple to use and ensures the sample remains under liquid during loading.
Sample handling
100mm or 150mm diameter wafers are held in a PTFE holding tray. The tray including wafer is immersed in acetone in order to remove all moisture from the sample. After dehydration, the wafer and holder is transferred into the pre-cooled sample chamber using the wafer transfer device. On completion of the critical point drying process, the wafer is removed from the chamber using the transfer device prior to further processing.
Key Features & Benefits