The iPHEMOS optical tool is an inverted semiconductor failure analysis system developed especially for working through the backside silicon of semiconductor devices.

The minute light emitted during the operation of CMOS transistors is picked up, and analysis of logic operations is carried out in two dimensions with picosecond precision.

Failure positions in semiconductor devices are found by detecting the light emitted by hot electrons, leaks, latchups and the like.

The heat generated by metal interconnection shorts, problems with contact hole resistance, oxide film microplasma leaks.

This device locates leak current paths and resistance abnormalities (via defects) in contacts using the "IR-OBIRCH" method where LSIs.