Like no other SEM in the world...

• The world's highest resolution 0.4nm at 30kV
• Hitachi's unique variable super ExB signal mode allows operator to optimize secondary and backscatter signal content of the image
• New BF/DF Duo-STEM detector allows simultaneous display of BF and DF images. Variable detection angle in DF STEM mode(option)

In spite of semi-in-lens SEM, in-lens SEM equivalent specification has been realized.

• Observation for standard 6inch or maximum 8inch (Option) wafer
  Wider non-destructive observation
• Image observation for various purposes is performed by the super ExB that is selectable information switch for signals from one detector
• Ultra low acceleration voltage observation from 100V by retarding function (Option)
  (For ArF resist, low-k film observation.)

The S-4300 offers excellent resolution capabilities of 1.5nm at 15kV and an impressive 5.0nm at just 1 kV. The S-4300 also features an integral image management processing & archiving system, which allows up to 40 thumbnail images to be displayed simultaneously.

Model SU-70 is a new concept SEM incorporating field proven Hitachi’s semi-in-lens technology for ultra high resolution, and Schottky electron gun. It features not only ultra high resolution (1.0 nm/15kV, 1.6nm*/l kV), but also observation of charge-up reduced image, compositional contrast image, ultra-low accelerating voltage image*, benefiting from highly-reputed Super ExB function. The Schottky electron gun enables to deal with wide variety of analytical work (EDX*, WDX*, EBSP*, etc) thanks to its 100 nA probe current. (*option)

The S-4700 is an extremely sophisticated FE-SEM which offers pre-programmed operating modes to allow the user to switch from high resolution conditions to microanalysis conditions at the click of the mouse with no change of objective aperture. Outstanding low kV performance produces a resolution of 2.5nm at 1kV at the microanalysis and specimen exchange position.

This versatile microscope with a thermal FE source has been designed for applications in the semiconductor industry, materials and biological sciences where excellent beam stability, and high resolution are essential. There is a choice of specimen stages and optional accessories include electron beam lithography, cathodoluminescence, EBSP and EDX.

The S-4300SE/N brings the resolution capabilities of the high brightness field-emission electron gun to variable pressure scanning electron microscopy. The wide operating pressure range of 10 - 1000 Pa allows examination of an even wider range of wet, oily or nonconductive samples. Outstanding resolution at low accelerating voltages and excellent sample handling capabilities combine performance with versatility.